Adding HCl during Chemical Vapor Deposition Produces Controlled Growth of 6H-SiC on On-Axis 6H-SiC(0001) Substrates

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ژورنال

عنوان ژورنال: MRS Bulletin

سال: 2000

ISSN: 0883-7694,1938-1425

DOI: 10.1557/mrs2000.141